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NovAseptic® cisterna GMP, USM T10, HS T10

Material
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SL 1.4435
Kakovost površine
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Ra ≤ 0,38 μm (15 μin)
Obdelava površine
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Elektropolirani
Delovna temperatura
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5 do 135 ºC (41 do 275 ºF)
razpon pH
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1-14
NovAseptic® cisterna GMP, USM T10, HS T10
Tip A
(mm)
B
(mm)
C
(mm)
D
(mm)
Št.
GMP 50 & USM T10 & HS T10 32.0 72.0 56.0 28.0 N.GM05/33
GMP 100 54.0 90.0 58.0 50.0 N.GM1/33
GMP 1000 62.0 150.0 69.0 58.0 N.GM10/33
GMP 10000 85.0 150.0 105.0 81.0 N.GM100/33
GMP 2000 85.0 150.0 73.0 81.0 N.GM20/33
GMP 20000 168.0 240.0 94.0 164.0 N.GM200/33
GMP 30000 168.0 240.0 115.0 164.0 N.GM300/33
GMP 500 54.0 90.0 68.0 50.0 N.GM5/33
GMP 5000 104.0 160.0 73.0 100.0 N.GM50/33